专利名称: Integration of capacitive elements in the form of perovskite ceramic
公开(告)号:
公开(公告)日: 2007-01-11 00:00:00
申请(专利)号: US20060407681(US2007007565)
申请日: 2006-04-20 00:00:00
发明(设计)人: UNIV FRANCOIS RABELAIS UFR SCI (FR)
(申请)专利权(人): GOUX LUDOVIC (BE);GERVAIS MONIQUE (FR)
内容: The use of a conductive bidimensional perovskite as an interface between a silicon, metal, or amorphous oxide substrate and an insulating perovskite deposited by epitaxy, as well as an integrated circuit and its manufacturing process comprising a layer of an insulating perovskite deposited by epitaxy to form the dielectric of capacitive elements having at least an electrode formed of a conductive bidimensional perovskite forming an interface between said dielectric and an underlying silicon, metal, or amorphous oxide substrate.

发布日期:2007-08-20 15:15:00

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