专利名称: CERAMIC HEATER AND APPARATUS MOUNTED THE SAME FOR MANUFACTURING SEMICONDUCTOR OR LIQUID CRYSTAL
公开(告)号:
公开(公告)日: 2006-12-07 00:00:00
申请(专利)号: JP2006186433( JP2006332068)
申请日: 2006-07-06 00:00:00
发明(设计)人: SUMITOMO ELECTRIC IND LTD
(申请)专利权(人): NATSUHARA MASUHIRO ; KOSHO MASARU
内容: To provide a ceramic heater having a plane for holding an object to be treated, in which the thermal uniformity of the plane is improved, and an apparatus having the the heater mounted thereon for manufacturing a semiconductor or a liquid crystal. ! The ceramic heater having the plane for holding an object to be treated has a resistance heating element on the surface other than the holding plane, or a plane inside of the holding plane. The thermal uniformity of the ceramic heater is improved and the temperature distribution of the surface of the object to be treated is made uniform by forming a lead circuit for supplying power to the resistance heating element on the plane different from the plane formed the resistance heating element. ! (C)2007,JPO&INPIT 

发布日期:2007-07-13 11:43:00

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