首页>>国外专利>>SOURCE ARC CHAMBER FOR ION IMPLANTER HAVING REPELLER ELECTRODE MOUNTED TO EXTERNAL INSULATOR
| 专利名称： | SOURCE ARC CHAMBER FOR ION IMPLANTER HAVING REPELLER ELECTRODE MOUNTED TO EXTERNAL INSULATOR |
| 公开（告）号： | |
| 公开（公告）日： | 2006-07-27 00:00:00 |
| 申请（专利）号： | US20050044659 ,US2006163489 |
| 申请日： | |
| 发明（设计）人： | |
| (申请)专利权（人）： | LOW RUSSELL J (US);COBB ERIC R (US);OLSON JOSEPH C |
| 内容： | An ion implanter has a source arc chamber including a conductive end wall at a repeller end of the arc chamber, the end wall having a central portion surrounding an opening. A ceramic insulator is secured to an outer surface of the end wall, such as by peripheral screw threads engaging mating threads at the periphery of a recessed area of the end wall. A conductive repeller has a narrow shaft secured to the insulator and extending through the end wall opening, and a body disposed within the source arc chamber adjacent to the end wall. The end wall, insulator and repeller are configured to form a continuous vacuum gap between the central portion of the end wall and (i) the repeller body, (ii) the repeller shaft, and (iii) the insulator. The insulator interior surface can have a ridged cross section. |
发布日期：2006-11-26 19:15:00